先进工艺对MOS器件总剂量辐射效应的影响

器件栅氧厚度的减小、场氧工艺的改变以及衬底材料的不同等都将导致MOS器件的总剂量辐射效应发生改变.亚阈斜率、阈值电压漂移、衬底技术和场氧抗辐射能力已经成为器件按比例缩小给器件带来冲击的最主要的四个方面.综述了上述条件、高k介质/硅系统以及选择SOI材料作为衬底材料对MOS器件总剂量辐射效应的影响.     

DRYING BEHAVIOR OF CULTURED MUSHROOMS

In this study, the drying behavior of cultured mushrooms with an initial moisture content of 93% (drying basis [ d.b. ]) was investigated experimentally for different slice thicknesses and drying air temperatures, and the suitability of various drying models in defining the drying behavior of mushrooms was determined by statistical analysis. Drying operation was carried out at temperatures of 40, 45, 50 and 60C and at a fixed air velocity of 2 m/s. The slice thicknesses of mushrooms were taken as 2, 4 and 6 mm. The experimental results show that the drying temperature has a significant effect on the moisture removal from mushrooms. However, it is also observed that increasing the temperature above a certain value for large values of slice thickness does not have a considerable effect on the drying rate. It may also be concluded from the experimental results that the increase in the slice thickness slows down the drying rate significantly. Furthermore, the results of statistical analysis show that the most suitable model in defining the drying behavior of mushrooms is the diffusion approach model.

PRACTICAL APPLICATIONS

Mushrooms are soft textured and extremely perishable. They begin to deteriorate shortly after harvest. Because of their short shelf life under normal ambient conditions of temperature and humidity, their preservation has assumed importance. The most common species that is also grown on a large scale in Turkey is the cultivated mushroom, Agaricus bisporus . They are low in calorie and have a delicate, appealing flavor. They contain about 91% water. Drying is the most common preservation method, especially for mushrooms to be used as ingredients for special sauces and soups. Preservation of mushrooms through drying makes it possible to limit microbial growth or other reactions by reducing moisture content, and allows efficiency in transportation and storage.     

沪宁高速公路桥梁拼接施工与质量控制

概述了沪宁高速公路扩建工程中桥梁拼接施工的工程特点,介绍了桥梁拼接施工工艺及质量控制,具体阐述了原桥与新桥拼接施工方法和拼接的湿按缝混凝土浇筑施工工艺,为今后同类工程积累了重要的施工经验。     

客户订单合成配送问题建模与遗传算法研究

为了降低成本,取得企业竞争优势,合理进行配送成为实现物流规模经济、降低物流成本的重要手段。在一些模型假设的基础上,建立了目标函数为最小化运距的客户订单合成配送问题的数学模型,提出并实现了解决该问题的遗传算法。大量仿真结果表明：该算法能够在较短的时间内有效求得问题的近优解,该算法的运行时间主要取决于订单数和交货组数,为实现物流配送提供了一个基本方法。     

磁偏转线圈的一个简单模型

本文针对复杂的磁偏转线较圈实体,提出了一个简单的模型,使得对实际偏转线圈结构的测量和数值模拟都较为简单,利用该模型,对实际14＂彩色显像管（CRT）的偏转线圈绕线结构进行了测量,在此基础上对该偏转线圈所产生的偏转磁场,光栅畸变和会聚误差进行了数值模型,计算所得结果与测量值相比,光栅畸变的最大差为0．84％,会聚误差的最大误差为0．61mm.     

根据行为级模型方法对CMOS 图像传感器的BJPG 晶体管的分析

本文提出一种新的用于CMOS图像传感器像素的光电检测器－－双极结型光栅晶体管。由于引入p^ n注入结，光电荷的读出速率大大增加，改善了CMOS图像传感器的工作速率和响应灵敏度。尽管传统的光电集成电路的电路级模拟采用微电子集成电路的模拟方法，但是光电子集成电路不仅含有微电子器件和电信号还含有光电检测器和光信号，采用传统的集成电路模拟方法有其局限性。本文提出一种行为级模拟方法（光电子检测器设计的新方法，利用C、MATLAB和HSPICE等语言写出光电子器件的模拟器）来模拟分析双极结型光栅晶体管的特性。基于0.6μm CMOS工艺的分析结果表明双极结型光栅晶体管在不同栅氧化层厚度随栅压变化与传统光栅晶体管的特性一样，但光电流密度呈指数式增长且光电流密度增大，因此改善了CMOS图像传感器的工作速率和响应灵敏度。     

基于小波域的深度残差网络图像超分辨率算法

单幅图像超分辨率（SISR）是指从一张低分辨率图像重建高分辨率图像.传统的神经网络方法通常在图像的空间域进行超分辨率重构，但这些方法常在重构过程中忽略重要的细节.鉴于小波变换能够将图像内容的"粗略"和"细节"特征进行分离，提出一种基于小波域的深度残差网络（DRWSR）.不同于其他传统的卷积神经网络直接推导高分辨率图像（HR），该方法采用多阶段学习策略，首先推理出高分辨率图像对应的小波系数，然后重建超分辨率图像（SR）.为了获取更多的信息，该方法采用一种残差嵌套残差的灵活可扩展的深度神经网络.此外，提出的神经网络模型采用结合图像空域与小波域的损失函数进行优化求解.所提出的方法在Set5、Set14、BSD100、Urban100等数据集上进行实验，实验结果表明，该方法的视觉效果和峰值信噪比（PSNR）均优于相关的图像超分辨率方法.